Pattern forming method and pattern forming apparatus

ABSTRACT

A method of forming a pattern for a semiconductor device comprises the steps of forming a photosensitive film on a substrate and radiating the photosensitive film on the substrate with a beam of a predetermined shape consisting of one of a charged particle beam and an electromagnetic beam, thereby forming an exposed region of a desired shape, the latter step including the step of exposing each of unit regions by a single shot of the beam of the predetermined shape for a predetermined period of time, repeating the exposure a plurality of times, and butt-joining the exposed unit regions to thereby form the exposed region of the desired shape, wherein, in the step of forming the exposed region of the desired shape, butting portions of the unit regions are situated in a first area of a layer to be formed other than a second area in the layer in which predetermined characteristics of a function of the semiconductor device are determined by a pattern width of the exposed region in association with another pattern formed in another layer.

BACKGROUND OF THE INVENTION

This invention relates to a pattern forming technique using a chargedparticle beam or an electromagnetic wave beam, and more particularly toa pattern forming method and a pattern forming apparatus for positioninga beam of any voluntary shape and repeating shot exposure andbutt-joining shots to form a desired pattern.

With the advance of high integration techniques relating to VLSIs andpattern dimension refining techniques, it has been difficult to secureaccurate pattern dimensions. In particular, it is considered necessaryto keep the dimensions of gate patterns within ±10% of the targetdimension, in order to restrain variations in the characteristics of atransistor within an allowable range. Further, it is considerednecessary to keep a dimension error due to lithography within ±7% of theabove target dimension. For example, where the gate pattern dimension is0.15 μm, the allowable dimension error in the lithography process isless than ±0.0105 μm.

Consider the case of forming a device pattern by first forming a mastermask (a photomask, an X-ray mask, an electron beam mask, an ion beammask, etc.) for the device pattern using a mask writing tool (whichwrites a pattern with an electron beam or a laser beam), then radiatingthe master mask with electromagnetic waves such as light, an X-ray,etc., or with charged particles such as an electron beam, an ion beam,etc. to thereby project an image of the mask on a wafer. In this case,the writing accuracy of the mask writing tool may be a main cause of thedimension error.

In the shot-by-shot exposure processing represented by the electron beamexposure technique, there are known a raster scan system for scanning aconstant beam, and a vector scan system for positioning a beam at anindividual coordinate to perform exposure thereat. The raster scansystem performs beam scanning in an analog manner. In this case, toincrease the speed of processing, the speed of beam scanning isincreased. If the beam size is reduced in order to enhance theresolution, the speed of processing will inevitably decrease. As amethod for realizing higher processing, the vector scan system isproposed, which employs a variable shaped beam and can increase the beamsize. In this system, setting of the beam size and positioning of thebeam are controlled by digital processing. Accordingly, the throughputand the pattern accuracy depend upon the setting speed of a DAC(digital-to-analog converter) employed therein.

A master mask such as a photomask, etc. requires high accuracy inpattern position and dimension. For example, a photomask for asemiconductor element requires that variations in pattern dimensionshould fall within a range of about 1/30 or less of a minimum linewidth, and variations in position should fall within a range of 5% orless of the minimum line width. In addition, further enhancement ofaccuracy is now required since the size of a semiconductor element hasbeen reduced to 70% in every three years.

BRIEF SUMMARY OF THE INVENTION

It is the object of the invention to provide a pattern forming methodand a pattern forming apparatus, which use position informationconcerning an area requiring high dimension accuracy in order to realizehigh writing accuracy.

According to a first aspect of the invention, there is provided a methodof forming a pattern for a semiconductor device, comprising:

the step of forming a photosensitive film on a substrate; and

the step of radiating the photosensitive film on the substrate with abeam of a predetermined shape obtained from one of a charged particlebeam and an electromagnetic beam, thereby forming an exposed region of adesired shape, the step including the step of exposing each of unitregions by a single shot of the beam of the predetermined shape for apredetermined period of time, repeating the exposure a plurality oftimes, and butt-joining the exposed unit regions to thereby form theexposed region of the desired shape;

wherein, in the step of forming the exposed region of the desired shape,butting portions of the unit regions are situated in a first area of alayer to be formed other than a second area of the layer in whichpredetermined characteristics of a function of the semiconductor deviceare determined by a pattern width of the exposed region in associationwith another pattern formed in another layer.

Preferably, the first area in which the butting portions of the unitregions are situated corresponds to an isolation region employed in thesemiconductor device.

More preferably, the second area in which the predeterminedcharacteristics of the predetermined function are determined by thepattern width of the exposed region corresponds to an active regionincorporated in a transistor in the semiconductor device.

Also preferably, the region in which the predetermined characteristicsof the predetermined function are determined by the pattern width of theexposed region corresponds to an electrode region to which an interlayercontact in the semiconductor device is connected.

The step of forming the photosensitive film on the substrate may use apositive-type photosensitive material or a negative-type photosensitivematerial.

According to a second aspect of the invention, there is provided amethod of forming a pattern comprising:

the step of forming a photosensitive film on a substrate; and

the step of radiating the photosensitive film on the substrate with abeam of a predetermined shape obtained from one of a charged particlebeam and an electromagnetic beam and emitted from a writing tool,thereby forming an exposed region of a desired shape, the step includingthe step of exposing each of unit regions by a single shot of the beamof the predetermined shape for a predetermined period of time, repeatingthe exposure a plurality of times, and butt-joining the exposed unitregions to thereby form the exposed region of the desired shape;

wherein the step of forming the exposed region of the desired shapeincludes the step of subjecting predetermined ones of the unit regionsto single shot exposure, and subjecting the other ones of the unitregions to multiple shot exposure.

Preferably, in the step of forming the exposed region of the desiredshape, the multiple shot exposure is performed by repeating the sameshot exposure in the same position.

Alternatively, in the step of forming the exposed region of the desiredshape, the multiple shot exposure is performed by changing the buttingposition of the unit regions in units of a single shot exposuretreatment.

Alternatively, the step of forming the exposed region of the desiredshape selectively uses multiple shot exposure in which the same shotexposure is repeated in the same position, and multiple shot exposure inwhich the butting position of the unit regions is changed in units of asingle shot exposure treatment.

The step of forming the photosensitive film on the substrate may use apositive-type photosensitive material or a negative-type photosensitivematerial.

Preferably, the step of forming the photosensitive film on the substrateincludes the step of using a combination of manners of optical overlapof first and second apertures employed in the writing tool to form thebeam of the predetermined shape, and the same combination of the mannersof optical overlap of the first and second apertures is used at the timeof subjecting to single shot exposure those of the unit regions whichhave the same shape.

According to a third aspect of the invention, there is provided anapparatus for forming a pattern for a semiconductor device, comprising:

beam shaping means for shaping, to a predetermined shape, one of acharged particle beam and an electromagnetic beam;

positioning means for positioning the position of the beam of thepredetermined shape in a single unit region of a substrate with aphotosensitive film formed thereon; and

shot exposure means for radiating the single unit region with the beamfor a predetermined period of time;

wherein the shot exposure means repeats shot exposure in units of asingle unit region to thereby form a desired exposed region; and

the positioning means sequentially forwards the position in which thebeam is to be radiated, butt-joins the single unit region to anothersingle unit region to form a plurality of butt-joined unit regions, andsituates butting portions of the butt-joined unit regions constitutingthe desired exposed region, in a first area of a layer to be formedother than a second area of the first layer in which predeterminedcharacteristics of a function of the semiconductor device are determinedby a pattern width of the exposed region in association with anotherpattern formed in another layer.

The positioning means can cause the second area in which the buttingportions of the unit regions are formed, to correspond to an isolationregion employed in the semiconductor device.

The positioning means determines the position of the beam such that thesecond area in which the predetermined characteristics of thepredetermined function are determined by the pattern width of theexposed region corresponds to an active region incorporated in atransistor in the semiconductor device.

The positioning means determines the position of the beam such that thesecond area in which the predetermined characteristics of thepredetermined function are determined by the pattern width of theexposed region corresponds to an electrode region to which an interlayercontact in the semiconductor device is connected.

According to a fourth aspect of the invention, there is provided anapparatus for forming a pattern comprising:

beam shaping means for shaping, to a predetermined shape, one of acharged particle beam and an electromagnetic beam;

positioning means for positioning the position of the beam of thepredetermined shape in a single unit region of a substrate with aphotosensitive film formed thereon; and

shot exposure means for radiating the single unit region with the beamfor a predetermined period of time;

wherein the shot exposure means subjects predetermined ones of the unitregions to single shot exposure, and the other ones of the unit regionsto multiple shot exposure, and the positioning means sequentiallyforwards the position in which the beam is to be radiated, andbutt-joins the single unit region to another single unit region to forma plurality of butt-joined unit regions.

Preferably, the shot exposure means performs the multiple shot exposureby repeating the same shot exposure in the same position.

More preferably, the shot exposure means performs the multiple shotexposure by changing the butting position of the unit regions in unitsof a single shot exposure treatment.

The shot exposure means may perform the multiple shot exposure byselectively using multiple shot exposure in which the same shot exposureis repeated in the same position, and multiple shot exposure in whichthe butting position of the unit regions is changed in units of a singleshot exposure treatment.

In the pattern exposure method for setting the size of a beam shot andthe position of the beam shot by means of digital processing, it isknown that a pattern formed by single shot exposure is superior, inprinciple, in dimension accuracy to a pattern formed by multiple shotexposure. Specifically, pattern portions formed by different shotexposure treatments have variations in dimension accuracy and positionaccuracy. In the case of a pattern formed by multiple shot exposure,pattern portions formed by different shot exposure treatments may welloverlap each other, thereby reducing the accuracy of dimension. On theother hand, in the case of forming each portion of a pattern byrepeating the exposure of the same shot, the position accuracy of eachportion is averaged, with the result that the pattern accuracy morelimited by position accuracy than by shot dimension is enhanced. Such anaveraging effect contributes to enhancement of the accuracy of a regionformed of an unexposed portion.

Application of the present invention will enhance particular accuracy ofa particular pattern portion. For example, in manufacturing asemiconductor element, high accuracy is required for the dimension of alimited portion such as the dimension of a particular pattern, thedimension of a particular portion of a particular pattern, or thedistance between particular portions of patterns.

Thus, the accuracy can be enhanced by applying the present invention toa pattern having portions formed by regularly repeating single shotexposure, or by applying the present invention to an extractedparticular portion of a pattern. More specifically, a pattern portionwhich should be limited by a single shot width is subjected to singleshot exposure, while other pattern portions are subjected to multipleshot exposure. In this case, the multiple shot exposure portion canobtain high accuracy in the dimension between pattern portions or in theposition of each pattern portion, and the single shot exposure portioncan obtain high accuracy in the dimension of the shot width.

Moreover, subjecting a peripheral portion of a selected unexposedportion to multiple shot exposure can enhance the accuracy of thedimension of the unexposed portion without significantly reducing thethroughput. In addition, the present invention enables exposure of aparticular portion with no butting portions, thereby enabling forming ofa pattern with little edge roughness and remarkable accuracy ofdimension.

Additional objects and advantages of the invention will be set forth inthe description which follows, and in part will be obvious from thedescription, or may be learned by practice of the invention. The objectsand advantages of the invention may be realized and obtained by means ofthe instrumentalities and combinations particularly pointed out in theappended claims.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

The accompanying drawings, which are incorporated in and constitute apart of the specification, illustrate presently preferred embodiments ofthe invention, and together with the general description given above andthe detailed description of the preferred embodiments given below, serveto explain the principles of the invention.

FIG. 1A is a schematic plan view, useful in explaining a conventionalmask design, including drawing elements divided by a conventionaldrawing division method;

FIG. 1B is a schematic plan view, useful in explaining a conventionalshot pattern produced on the basis of the design of FIG. 1A, wherein thedivided elements are actually shot on the mask substrate;

FIG. 1C is a schematic plan view, useful in explaining a conventionalphotomask produced using the shot pattern shown in FIG. 1B;

FIG. 1D is a schematic plan view, useful in explaining a conventionalpattern on wafer worked using the photomask shown in FIG. 1C;

FIG. 2A is a schematic plan view, useful in explaining a mask designaccording to a first embodiment of the invention, including drawingelements divided by the division method of this invention;

FIG. 2B is a schematic plan view, useful in explaining a shot patternaccording to the first embodiment, produced on the basis of the designof FIG. 2A, wherein the divided elements are actually shot on the masksubstrate;

FIG. 2C is a schematic plan view, useful in explaining a photomaskaccording to the first embodiment, produced using the shot pattern shownin FIG. 2B;

FIG. 2D is a schematic plan view, useful in explaining a pattern onwafer according to the first embodiment, worked using the photomaskshown in FIG. 2C;

FIG. 3A is a schematic plan view, useful in explaining a mask designaccording to a second embodiment of the invention, including drawingelements divided by the division method of this invention;

FIG. 3B is a schematic plan view, useful in explaining a shot patternaccording to the second embodiment, produced on the basis of the designof FIG. 3A, wherein the divided elements are actually shot on the masksubstrate;

FIG. 3C is a schematic plan view, useful in explaining a photomaskaccording to the second embodiment, produced using the shot patternshown in FIG. 3B;

FIG. 3D is a schematic plan view, useful in explaining a pattern onwafer according to the second embodiment, worked using the photomaskshown in FIG. 3C;

FIG. 4A is a view, useful in explaining a mask size employed in a thirdembodiment of the invention;

FIG. 4B is a view, showing a pattern layout according to the thirdembodiment;

FIG. 5A is a view, showing another pattern according to the thirdembodiment;

FIGS. 5B-5E show forming of the pattern of FIG. 5A in a stepwise manner;

FIG. 6A is a view, useful in explaining a mask size employed in a fourthembodiment of the invention; and

FIG. 6B is a view, showing a pattern layout according to the fourthembodiment.

FIG. 7 is a block diagram of a mask writing tool used in this invention.

DETAILED DESCRIPTION OF THE INVENTION

Before the description of the embodiments of the invention, a problemwhich may occur in forming a pattern using a charged particle beam or alight beam will be explained.

FIG. 1A is a plan design view, showing a memory cell array patternemployed in a VLSI. In FIG. 1A, reference numeral 41 denotes an activearea pattern, and reference numeral 42 a gate pattern. The gate pattern42 should be noted. Although the active area pattern 41 is formed, usinga mask, in a layer different from a layer in which the gate pattern isformed using another mask, the active area pattern is indicated by thebroken lines in order to clarify the positional relationship between theactive area pattern 41 and the gate pattern 42. The active areas 41 areisolated by a peripheral isolation region 40. Two gate lines 42 a and 42b intersect a single active area 41 a, thereby forming two transistorsconnected in series.

To actually form a gate pattern on a wafer, a photomask is formed on thebasis of a plan design drawing, thereby radiating the photomask withlight to transfer an image of the mask on the wafer. The photomask isformed by depositing an opaque film on a major surface of a quartzsubstrate, then coating a resist thereon, writing a mask image in theaforementioned manner using a mask writing tool (i.e. with an electronbeam or a laser beam), developing the resist and etching the opaquefilm.

The mask writing tool divides a to-be-drawn device pattern into portionsof dimensions which it can draw, and exposes each portion. Accordingly,the gate pattern 42 shown in FIG. 1A is divided into elements 43 (aportion hatched for easy recognition) which each correspond to one shotexposure. At the time of exposing each element 43 by the mask writingtool, the actual point of exposure may well be displaced from a targetpoint because of the above-mentioned tool error. FIG. 1B shows anexample of a state in which the elements of the gate pattern areactually exposed on the photomask substrate. To clarify the positionalrelationship between the active area pattern and the gate pattern, theactive area pattern is indicated by the broken lines as in the case ofFIG. 1A.

In the conventional case shown in FIG. 1B, there are gate patternportions which are butt-joined to each other on the isolation region 40as indicated by reference numeral 44, while there are gate patternportions which are butt-joined to each other on the active area patternas indicated by reference numeral 45. FIG. 1C is a plan view, showing aphotomask drawn by the above method. In FIG. 1C, reference numeral 46denotes the gate pattern. Since in this case, a negative-type resist hasbeen used, the resist remains in exposed portions after development.Using the resist as a mask, the opaque film is etched thereby to form apattern. Also in FIG. 1C, the active area pattern is indicated by thebroken lines so as to clarify the positional relationship between theactive area pattern and the gate pattern. As is evident from FIG. 1C,the butting portions of the gate pattern have different dimensions.

FIG. 1D is a plan view, showing a gate pattern on a wafer resulting fromexposure using the photomask of FIG. 1C. Since in this case, apositive-type resist has been used, the resist remains in unexposedportions after development. Reference numeral 47 denotes portions onwhich the resist remains. Using the resist pattern as a mask, the waferis etched. Also in FIG. 1D, an active area pattern 48 formed in aprevious step is shown under the gate pattern.

Those portions of the gate pattern on the photomask which correspond tothe butting portions of the photomask as shown in FIG. 1C have differentdimensions. Therefore, at a portion as indicated by reference numeral 49in FIG. 1D, at which writing is performed by a single shot on an activearea, high dimension accuracy is obtained. On the other hand, at aportion as indicated by reference numeral 410, at which the dimensiongreatly varies on an active area, variations in dimension adverselyaffect the transistor characteristics, thereby increasing the range ofvariations in device characteristics in the chip.

As described above, in the conventional case, shot exposure is performedin voluntary positions at the time of write a gate pattern fortransistors in mask writing. Accordingly, the gate pattern may have abutting portion located in a corresponding portion of an active area.The butting portion on the active area pattern will adversely affect thetransistor characteristics and hence increase the range of variations indevice characteristics. Thus, in the conventional case, there may be abutting portion even in a region in which high dimension accuracy mustbe required, with the result that stable device characteristics cannotbe obtained.

The present invention has been developed in light of the above-describedcircumstances. The invention will be described in detail with referenceto the drawings.

First Embodiment

Referring first to FIGS. 2A-2D, a first embodiment of the invention willbe described. FIG. 2A is a plan design drawing, showing a memory cellarray pattern employed in a VLSI. Reference numeral 11 denotes an activearea pattern, and reference numeral 12 a gate pattern. The gate pattern12 should be noted. Although the active area pattern 11 is formed, usinga mask, in a layer different from a layer in which the gate pattern isformed using another mask, the active area pattern is indicated by thebroken lines in order to clarify the positional relationship between theactive area pattern 11 and the gate pattern 12. The active area pattern11 is surrounded by a peripheral isolation region 10. In the actualsemiconductor element, the gate pattern 12 is formed on both the activearea pattern 11 and the isolation region 10. Two gate lines 12 a and 12b intersect a single active area, for example, 11 a, thereby forming twotransistors connected in series (a memory cell of a so-called 2-cell1-bit-line structure).

To actually form a gate pattern on a wafer, a photomask is formed on thebasis of a plan design drawing, thereby radiating the photomask withlight to transfer an image of the mask to the wafer. The photomask isformed by depositing an opaque film on a major surface of a quartzsubstrate, then coating a resist thereon, writing a mask image in theaforementioned manner using a mask writing tool (i.e. with an electronbeam or a laser beam), developing the resist and etching the opaquefilm.

The mask writing tool divides a to-be-drawn device pattern into portionsof dimensions which it can draw, and exposes each portion. Accordingly,the gate pattern 12 shown in FIG. 2A is divided into elements 13 whicheach correspond to one shot exposure (the element 13 is hatched for easyunderstanding). Suppose the case where the element 13 is formed by shotexposure in a position deviated from a predetermined position because ofa tool error.

FIG. 2B shows a state in which the elements of the gate pattern areactually exposed on the photomask. To clarify the positionalrelationship between the active area pattern and the gate pattern, theactive area pattern is indicated by the broken lines as in the case ofFIG. 2A. In this embodiment, all elements of the gate pattern aredivided such that they are butt-joined on the isolation region 10.

FIG. 2C is a plan view, showing a photomask drawn by the method of theinvention. In FIG. 2C, reference numeral 16 denotes the gate pattern.Since in this case, a negative-type resist is used, the resist remainsin exposed portions after development. Using the resist as a mask, theopaque film is etched thereby to form a pattern. Also in FIG. 2C, theactive area pattern is indicated by the broken lines so as to clarifythe positional relationship between the active area pattern and the gatepattern. As is evident from FIG. 2C, the butting portions of the gatepattern have different dimensions.

FIG. 2D is a plan view, showing a gate pattern on a wafer resulting fromexposure using the photomask of FIG. 2C. Since in this case, apositive-type resist is used, the resist remains in unexposed portionsafter development. Reference numeral 17 denotes portions on which theresist remains. Using the resist pattern as a mask, the wafer is etched.Also in FIG. 2D, an active area pattern 18 formed in a previous step isshown under the gate pattern. The gate length is 0.15 μm.

Also in the first embodiment of the invention, those portions of thegate pattern on the photomask which correspond to displaced portions ofthe photomask due to shot exposure as shown in FIG. 2C have differentdimensions. In this embodiment, however, all the butting portions withdifferent dimensions are located in the isolation region. Accordingly,the range of variations in dimension is extremely small in the areacorresponding to the active areas, with the result that a dimensionaccuracy of ±0.0105 μm or less according to the specifications relatingto gate dimensions can be achieved over the entire surface of the chip.There may be a case where a butting portion in the isolation region hasa wide width and extends even to an active area. In this case, however,only the area of a source/drain region varies, and influence upon thetransistor characteristics can be ignored.

As described above, in the first embodiment, the butting portions of thegate pattern are located in the isolation region at the time of forminga gate pattern by mask writing, thereby minimizing variations in thedimensions of the gate pattern on the active area pattern and henceminimizing variations in device characteristics.

Second Embodiment

Referring then to FIGS. 3A-3D, a second embodiment of the invention willbe described. FIG. 3A is a plan design view, showing an electrodepattern for a contact hole included in the gate pattern of transistorsincorporated in a VLSI. Reference numeral 21 denotes an element includedin the gate pattern, and reference numeral 22 an element indicative ofan electrode pattern in a contact region of the gate pattern. A contacthole pattern 23 is formed in a layer different from a layer in which thegate pattern is formed. However, to clarify the positional relationshipbetween the gate pattern and the contact hole pattern, the contact holepattern is indicated by the broken lines.

A photomask is formed on the basis of the plan design view of FIG. 3A,thereby radiating the photomask with light to transfer an image thereofto the wafer. The photomask is formed in the same procedure as in thefirst embodiment. As aforementioned, the gate pattern is divided intoelements 21 and 22, each of which is formed by a single shot ofexposure.

At the time of forming the elements by shot exposure by means of a maskwriting tool, their images may be formed in positions deviated frompredetermined positions. FIG. 3B shows a case where the elements of thegate pattern are formed on those portions of the photomask which aredeviated from predetermined portions. To clarify the positionalrelationship between the gate pattern and the contact hole pattern, thecontact hole pattern is indicated by the broken lines as in the FIG. 3Acase. At butting portion 27 between the elements 21 and 22, there occursa disconnection due to shot displacement.

The second embodiment is characterized in that the element (electrode)22 of the gate pattern to be butt-joined to the contact hole is formedby a single shot of exposure. FIG. 3C is a plan view, showing aphotomask formed in the method employed in the second embodiment. InFIG. 3C, a hatched pattern 25 is the gate pattern. Since in this case, anegative-type resist is used, the resist remains in exposed portionsafter development. Using the resist as a mask, the opaque film is etchedthereby to form a photomask pattern. Also in FIG. 3C, the contact holepattern 23 is indicated by the broken lines so as to clarify thepositional relationship between the gate pattern and the contact holepattern. As is evident from FIG. 3C, the portion 28 corresponding to thebutting portions of the elements have reduced dimensions.

FIG. 3D is a plan view, showing a gate pattern on a wafer resulting fromexposure using the photomask of FIG. 3C. Since in this case, apositive-type resist is used, the resist remains in unexposed portionsafter development. In FIG. 3D, reference numeral 26 denotes a portion onwhich the resist remains. Using the resist pattern as a mask, aconductive layer formed on a wafer is etched. Also in FIG. 3D, a contacthole pattern 23 formed in a later step is indicated by the broken lines.The gate length is 0.15 μm.

In FIG. 3D, those portions 29 of the gate pattern which correspond tothe butting portions of the photomask of FIG. 3C with reduced dimensionshave reduced dimensions. In this embodiment, however, all the buttingportions with reduced dimensions are located in the region other thanthe contact hole. Accordingly, the range of reductions in dimension isextremely small where the contact hole is connected, with the resultthat no contact failure and good device characteristics can be achieved.

In the first and second embodiments, there is provided a mask writingtool 70 (an apparatus for forming a pattern for a semiconductor device),as shown in FIG. 7, which comprises a beam shaping unit 72 for shaping,to a predetermined shape, one of a charged particle beam and anelectromagnetic beam, a positioning unit 74 for positioning the positionof the beam of the predetermined shape in a single unit region of asubstrate with a photosensitive film formed thereon, and a shot exposureunit 76 for radiating the single unit region with the beam for apredetermined period of time. The shot exposure unit 76 repeats shotexposure in units of a single unit region to thereby form a desiredexposed region, and the positioning unit 74 sequentially forwards theposition in which the beam is to be radiated, butt-joins the single unitregion to another single unit region to form a plurality of butt-unitregions, and situates butting portions of the butt-jointed unit regionsconstituting the desired exposed portion, in a first area of a layer tobe formed other than a second area of the first layer in whichpredetermined characteristics of a function of the semiconductor deviceare determined by a pattern width of the exposed region in associationwith another pattern formed in another layer.

Although in the first and second embodiments, the pattern formingmethod, the pattern forming apparatus, the mask itself, and thesemiconductor devices produced using them have been described withreference to a photomask for producing a semiconductor device, inparticular, to exposure of a gate layer for transistors, the inventionis not limited to the above. The subject matter of the invention lies inthat any portion which requires high accuracy of dimension is subjectedto single shot exposure, and in portions which do not require highaccuracy of dimension shots are butt-joined to each other. Thistechnique is also applicable to a mask for exposure using X-rays, a maskfor image transfer using an electron beam, or to a direct writingtechnique for directly writing a pattern on a wafer without any masks.

Third Embodiment

A third embodiment suitable to production of a reticle using a variableshaped electron beam will now be described.

First, a 6-inch square blank with a thickness of 0.25 inch, whichincludes a quartz substrate and an opaque film consisting of a chromethin film and a chrome oxide film laminated thereon, is coated with afilm of negative-type electron beam resist SAL605 (produced by ShipleyCorporation) with a thickness of 0.5 μm, and then subjected to apredetermined baking treatment. Subsequently, the resultant structure issubjected to an exposure treatment using a variable shaped electron beam(VSB) aligner which is operable with an acceleration voltage of 15 KeV.

The exposure treatment is performed by a variable shaped beam method. Inthis method, two apertures provided in the aligner are combined. A beamhaving passed a first aperture is further passed a second aperture, tothereby create a beam with a square cross section having each side of2.55 μm at maximum or with a right-angled triangular cross sectionhaving a shorter side of 2.55 μm at maximum. Further, the amount ofexposure is varied for each pattern. Those portions of a pattern whichare to be exposed by a single shot are exposed with a beam of 8 μC/cm²,while the other portions are exposed with a beam of 2 μC/cm².Thereafter, those portions having been exposed with the beam of 2 μC/cm²are further exposed three times with the beam of 2 μC/cm². Accordingly,the amount of exposure of the overall pattern is 8 μC/cm². At the timeof subjecting patterns of the same shape to single-shot exposure, it isdesirable to use the same combination of optically overlapping mannersof the first and second apertures. This is because even if the patternshave the same shape, a difference may occur in dimension accuracy whenthe apertures are made to optically overlap each other in differentmanners.

Subsequently, the resultant substrate is taken out of the aligner, andsubjected to a predetermined baking treatment. Then, the resultantsubstrate is subjected, for 80 seconds, to a puddle developmenttreatment using a dedicated developer, then to a rinse treatment usingdeionized water, and to a drying treatment to thereby form a resistpattern. Thereafter, the resultant structure is baked at 115° C. for 15minutes. Then, the resultant structure is subjected to descum etchingperformed by a diode parallel plate RF plasma etching system using a gasmixture of oxygen and nitrogen (oxygen:nitrogen=15:85). The descumetching is performed for 45 seconds with a power of 50 W under anegative pressure of 100 mTorr.

The resultant structure is then etched at 70° C. by means of a parallelplate magnetron RF plasma etching system, using a gas mixture ofchloride, oxygen and argon (chloride:oxygen:argon=95:5:100). The etchingis performed with a power of 150 W for 15 minutes. Thereafter, theresist on the resultant structure is removed by etching using ozone as amain reactive gas.

The mask thus produced is shown in FIGS. 4A and 4B. For facilitating theexplanation of a pattern, FIG. 4A shows only a pair of pattern portions.A width a of each pattern portion (its designed value is 0.64 μm) and aninterval b between each pair of adjacent pattern portions (its designedvalue is 0.72 μm) were measured with respect to those 100 portions of amask which were taken from an edge of the mask. The measured mask has apattern portion repeated as shown in FIG. 4B. The measurements providesvariations in which 12.8 nm and 32 nm are obtained at 3σ (σ:standardvariation) concerning the width a and the interval b, respectively. InFIGS. 4A and 4B, the hatched portions are opaque film portions remainingafter exposure, development and etching. This mask is an enlarged onewhich has an area four times the area of the actual LSI pattern. Thepattern includes portions A which each have a length of 0.64 μm and abreadth of 1.2 μm, and portions C which each have a length of 0.72 μmand a breadth of 1.2 μm.

The width a indicates the length of the portion A formed by single shotexposure (writing), while the interval b indicates the interval betweenthe portions C formed by four-time shot exposure (writing). The portionsA of the pattern were preferentially located at center portions of themask so that no butting portions would be formed therein.

As described above, in the third embodiment, the portions A whichrequire high accuracy of dimensions are formed by single shot writing,and the portions C which require high accuracy of position are formed byfour-time shot writing, with the result that the pattern intervals areset very precisely, with particular portions of the pattern formed withhigh accuracy of dimensions.

In the conventional method, the butting portions of the elements of apattern are situated in any voluntary positions, and also there is noprinciple as to whether single shot exposure or multiple shot exposureshould be used. Accordingly, variations in dimensions a and b in FIG. 4Areach as high as 25 nm and 60 nm, respectively. It is evident from theseresults that the present invention provides a significant advantage.

To make butting portions inconspicuous in a pattern with lines 31 andspaces 32 (i.e. an L/S pattern) as shown in FIG. 5A, exposure should beperformed as follows:

As is shown in FIGS. 5B-5E, the L/S pattern is formed by displacing theshot exposure positions of elements 33 from each other in units of asingle exposure treatment. More specifically, in a first exposuretreatment, the elements 33 are butt-joined in positions shown in FIG.5B. Similarly, in a second exposure treatment, the elements 33 arebutt-joined in positions shown in FIG. 5C, and in a third exposuretreatment, they are butt-joined in positions shown in FIG. 5D. In afourth or the last exposure treatment, the elements 33 are butt-joinedin positions shown in FIG. 5E. Thus, shot exposure is performed fourtimes in total. These exposure treatments make the butting portions ofthe L/S pattern inconspicuous.

As described above, depending upon the purpose, the invention can switchthe exposure method, on a single layer, between the multiple shotexposure shown in FIG. 4A (in which the same shot exposure is repeatedin the same position), and the multiple shot exposure shown in FIGS.5B-5E (in which the butting positions are changed).

Fourth Embodiment

A fourth embodiment suitable to production of a reticle using a variableshaped electron beam will be described.

First, a substrate to be exposed, which is coated with positive-typebeam resist ZEP-7000B (produced by Nippon Zeon Corporation), is preparedin the same process employed in the third embodiment. In the fourthembodiment, only an exposure portion in which a particular unexposedportion is to be formed is subjected to eight-time shot exposure, andother portions are subjected to single shot exposure. The requiredtreatment time was about 37 minutes in the case of subjecting theoverall substrate to single shot exposure, and about 41 minutes 30seconds in the case of subjecting part of the substrate toaforementioned eight-time shot exposure. The amount of exposure is 10μC/cm². The substrate taken from the exposure unit is subjected to aspray developing treatment for 360 seconds using a dedicated developer,then to a rinse treatment and to a dry treatment, thereby forming aresist pattern.

Thereafter, an etching treatment is performed after the same treatmentsas in the third embodiment are performed, thereby producing a mask asshown in FIGS. 6A and 6B. For facilitating the explanation of thedimensions, only a pair of pattern portions are shown in FIG. 6A. Awidth a of each pattern portion (its designed value is 0.64 μm) and aninterval b between each pair of adjacent pattern portions (its designedvalue is 0.72 μm) were measured with respect to those 100 portions of amask which were taken from an edge of the mask. The measured mask has apattern portion repeated as shown in FIG. 6B. The measurements providesvariations in which satisfactory values of 18.0 nm and 21.3 nm areobtained at 3σ(σ:standard variation) concerning the width a and theinterval b, respectively. In FIG. 6B, the hatched portion is an opaquefilm with openings formed after exposure, development and etching. Thismask is an enlarged one having an area four times the area of the actualLSI pattern. The pattern includes openings A which each have a length of0.64 μm and a breadth of 1.2 μm, and openings C which each have a lengthof 0.72 μm and a breadth of 1.2 μm.

The width a indicates the length of the opening A formed by single shotexposure (writing), while the interval b indicates the interval betweenthe openings C formed by four-time shot exposure (writing). The openingsA of the pattern were preferentially located at center portions of themask so that no butting portions would be formed therein.

In the third and fourth embodiments, there is provided a mask writingtool 70 (an apparatus for forming a pattern for a semiconductor device),as shown in FIG. 7, which comprises a beam shaping unit 72 for shaping,to a predetermined shape, one of a charged particle beam and anelectromagnetic beam, a positioning unit 74 for positioning the positionof the beam of the predetermined shape in a single unit region of asubstrate with a photosensitive film formed thereon, and a shot exposureunit 76 for radiating the single unit region with the beam for apredetermined period of time. The shot exposure unit 76 subjectspredetermined ones of the unit regions to single shot exposure, and theother ones of the unit regions to multiple shot exposure, and thepositioning unit 74 sequentially forwards the position in which the beamis to be radiated, and butt-joins the single region to another singleunit region to form a plurality of butt-joined unit regions.

Although in the third and fourth embodiments, the pattern formingmethod, the pattern forming apparatus, the mask itself, and thesemiconductor devices produced using them have been described withreference to a photomask for producing a semiconductor device, theinvention is not limited to the above. The subject matter of theinvention lies in that any portion which requires high accuracy ofdimension is subjected to single shot exposure, whereas portions whichdo not require high accuracy of dimension are subjected to multiple shotexposure. This technique is also applicable to a mask for exposure usingX-rays, a mask for image transfer using an electron beam, or to a directwriting technique for directly writing a pattern on a wafer without anymasks.

Moreover, as is evident from the descriptions recited in the third andfourth embodiments, the invention aims to provide a method for achievingrequired accuracy of dimension by the combination of multiple writingand single writing, or the combination of a portion formed by singleshot exposure and a portion formed by multiple shot exposure. Theinvention can provide a technique for enhancing the accuracy of thedimensions of a particular portion by more free combination of exposuremethods as a result of properly using a positive-type resist and anegative-type resist at the time of exposure. Further, at the time ofperforming multiple shot exposure, the invention can provide a moresignificant advantage by displacing regions (sub-fields), which are tobe covered by a beam deflection maximum value, in units of a single shotexposure treatment, using a sub-deflector incorporated in the electronbeam exposure apparatus.

In addition, the apparatus for writing a pattern is not limited to theelectron beam writing apparatus, but may be an ion beam writingapparatus, or a laser writing apparatus using a light beam other thanthe charged particle beams. Also, the invention may be modified invarious manners without departing from the scope thereof.

Since as described above, pattern portions formed by shots arebutt-joined in particular regions determined on the basis of a patternformed of another layer, variations in dimension of the butt-joinedpattern portions are prevented from adversely affecting the devicecharacteristics. As a result, variations in device characteristics canbe minimized.

Furthermore, a pattern can be formed with substantially high accuracy byperforming single shot exposure in a region in which high accuracy ofdimension is required, and performing multiple shot exposure in a regionin which high accuracy of position is required.

Additional advantages and modifications will readily occur to thoseskilled in the art. Therefore, the invention in its broader aspects isnot limited to the specific details, and representative embodimentsshown and described herein. Accordingly, various modifications may bemade without departing from the spirit or scope of the general inventiveconcept as defined by the appended claims and their equivalents.

What is claimed is:
 1. An apparatus for forming a pattern for asemiconductor device, comprising: beam shaping means for shaping, to apredetermined shape, one of a charged particle beam and anelectromagnetic beam; positioning means for positioning the position ofthe beam of the predetermined shape in a single unit region of asubstrate with a photosensitive film formed thereon, sequentiallyforwarding the position in which the beam is to be radiated,butt-joining the single unit region to another single unit region toform a plurality of butt-joined unit regions, and situating buttingportions of the butt-joined unit regions constituting the desiredexposed region, in a first area of a layer to be formed other than asecond area of the layer in which predetermined characteristics of afunction of the semiconductor device are determined by a pattern widthof the exposed region in association with another pattern formed inanother layer; and shot exposure means for radiating the single unitregion with the beam for a predetermined period of time and forrepeating shot exposure in units of a single unit region to thereby forma desired exposed region.
 2. The apparatus according to claim 1, whereinthe positioning means causes the second area in which the buttingportions of the unit regions are formed, to correspond to an isolationregion employed in the semiconductor device.
 3. The apparatus accordingto claim 1, wherein the positioning means determines the position of thebeam such that the second area in which the predeterminedcharacteristics of the predetermined function are determined by thepattern width of the exposed region corresponds to an active regionincorporated in a transistor in the semiconductor device.
 4. Theapparatus according to claim 1, wherein the positioning means determinesthe position of the beam such that the region in which the predeterminedcharacteristics of the predetermined function are determined by thepattern width of the exposed region corresponds to an electrode regionto which an interlayer contact in the semiconductor device is connected.5. An apparatus for forming a pattern comprising: beam shaping means forshaping, to a predetermined shape, one of a charged particle beam and anelectromagnetic beam; positioning means for positioning the position ofthe beam of the predetermined shape in a single unit region of asubstrate with a photosensitive film formed thereon, sequentiallyforwarding the position in which the beam is to be radiated, andbutt-joining the single unit region to another single unit region toform a plurality of butt-joined unit regions; and shot exposure meansfor radiating the single unit region with the beam for a predeterminedperiod of time and for subjecting predetermined ones of the unit regionsto single shot exposure, and the other ones of the unit regions tomultiple shot exposure.
 6. The apparatus according to claim 5, whereinthe shot exposure means performs the multiple shot exposure by repeatingthe same shot exposure in the same position.
 7. The apparatus accordingto claim 5, wherein the shot exposure means performs the multiple shotexposure by changing the butting position of the unit regions in unitsof a single shot exposure treatment.
 8. The apparatus according to claim5, wherein the shot exposure means performs the multiple shot exposureby selectively using multiple shot exposure in which the same shotexposure is repeated in the same position, and multiple shot exposure inwhich the butting position of the unit regions is changed in units of asingle shot exposure treatment.